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Tetramethylammonium Hydroxide

CAS #: 75-59-2

One of the industrial uses of tetramethylammonium hydroxide is for the anisotropic etching of silicon. It is also used as a basic solvent in the development of acidic photoresist in the photolithography process.

Synonyms: TMAH

Tetramethylammonium Hydroxide Technical 7960
(CH<sub>3</sub>)<sub>4</sub>NOH

(CH3)4NOH