Buffered Oxide Etch
Buffered oxide etches are primarily used in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4) in the microelectronics industry.
| Buffered Oxide Etch 6:1 | ElectroPUR® SEMI | SEMI | 3309 |
| Buffered Oxide Etch 10:1 | ElectroPUR® SEMI | SEMI | 3311 |
| Buffered Oxide Etch 5:1 (Modified) | Electronic | 3305 | |
| Buffered Oxide Etch 7:1 | ElectroPUR® SEMI | SEMI | 3304 |
